Research Status and Development Trend of High Purity Chromium Target Material for Magnetron Sputtering
Author of the article:XU Fei;BU Guoliang;YANG Wanpeng;CHENG Jiajia;XIAO Fulan
Author's Workplace：Xi’an Jiaye Aviation Technology Co.,Ltd.,Xi'an 710089,China
Key Words：magnetron sputtering high purity chromium target research status development trend
Abstract：
The main preparation process and research status of pure chromium target materials were introduced.AISO,introdced the density of pure chromium target cylinder prepared by hot isostatic pressure is up to 99.86%,with fine grain and excellent sputtering performance.The characteristics of high purity sputtered chromium target were described and the problems existing in high purity chromium target were analyzed.The development trend of high purity chromium sputtering target was discussed and prospected.
